12.5.4 Deposition Rate

In order to calculate the thickness $\Delta d$ of the film deposited during a time interval of length $\Delta t$, we observe that $\Delta d$ is proportional to $\Delta t$, to an Arrhenius term, and to the deposition rate $R_i$ corresponding to the deposition model chosen. Thus the formula

$$\Delta d = \Delta t \cdot k_e \mathrm{e}^{-E/kT} \cdot R_i$$

was used. Here $k_e \mathrm{e}^{-E/kT}$ is the Arrhenius term with activation energy $E$, absolute temperature $T$ and pre-exponential constant $k_e$. $R_i$ is one of $R_1$, $R_2$, $R_3$, or $R_4$, where the partial pressure $P_\textsc{teos}\xspace$ occurring in the $R_i$ is related to the local concentration by (12.2).