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4.2 Silicon Thin Layers

In this section, the effects of confinement and orientation on the phonon transport properties of ultra-thin silicon layers of various surface and transport orientations are investigated. Figure 4.7 shows the geometrical cross sections of the thin-layers considered. The layers have $ \{100\}$ , $ \{110\}$ , $ \{111\}$ , and $ \{112\}$ surface orientations. In all cases, we consider the $ x$ -axis to be parallel to the $ \textless 110\textgreater$ orientation, and define the angle $ \theta$ of the transport direction counter-clockwise from the $ x$ -axis. Below, a complete analysis is presented by calculating the phononic properties and thermal conductance as a function of the angle $ \theta$ for the four surface orientations mentioned. The layer thickness $ H$ varies from $ 1$ to $ 16~\mathrm{nm}$ . The phononic dispersion, density of states, ballistic transmission, and effective group velocity of the different structures are calculated.

Figure 4.7: The atomistic structure of the cross sections of the different thin silicon layers investigated (a) $ \{100\}$ , (b) $ \{110\}$ , (c) $ \{111\}$ , and (d) $ \{112\}$ surface. In all cases the $ x$ -axis is along the $ \textless 110\textgreater$ transport direction. Transport orientations $ \theta$ varies between 0 and $ \pi$ .
Image TLStructure


Subsections
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Next: 4.2.1 Anisotropy in Ultra-Thin Silicon Layers Up: 4. Ballistic Thermal Properties of Silicon-Based Nanostructures Previous: 4.1.3 Discussion   Contents
H. Karamitaheri: Thermal and Thermoelectric Properties of Nanostructures