Trap-assisted generation and recombination is modeled using the Shockley-Read-Hall model
[289]. The rate dependence on the carrier concentration is
described by the expression
|
(5.47) |
where
and
depict the generation/recombination lifetimes for electrons and
holes, respectively. The auxiliary variables
and
are defined as
There, the effective densities of states for electrons and holes are denoted by
and
and the conduction and valence band edges by
and
,
respectively. The most effective generation/recombination centers are those
with an energy
close to the mid of the band-gap. The
generation/recombination lifetimes
and
at room temperature can
be expressed as
where they are dependent on the trap concentration
as well as the trap
capture cross sections
and
for electrons and holes,
respectively. The thermal velocities for electrons and holes are expressed as
|
(5.52) |
in order to formulate the generation/recombination lifetimes dependent on the
trap concentration
as well as the trap capture cross sections
and
for electrons and holes, respectively. Furthermore, the temperature
dependence of the generation/recombination lifetimes is described by the
empirical power law
Additionally, doping dependent generation/recombination lifetimes can be
introduced using the Scharfetter relation
which can be used to calibrate the model to experimental data. Since the
lifetimes strongly depend on the process technology as well as material
quality, the parameters have to be determined from sample to sample. While in
single crystals relatively long lifetimes can be expected, grain boundaries
within sintered samples have a reducing effect.
M. Wagner: Simulation of Thermoelectric Devices