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- K1
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J.M. Park, R. Klima, S. Selberherr,
``High-Voltage Lateral Trench Gate SOI-LDMOSFETs,''
in Microelectronics Journal, Vol. 35, No. 3, pp. 299-304, 2004.
- K2
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J.M. Park, S. Wagner, T. Grasser, S. Selberherr,
``New SOI Lateral Power Devices with Trench Oxide,''
in Solid-State Electronics, Vol. 48, No. 6, pp. 1007-1015, 2004.
- K3
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J.M. Park, T. Grasser, H. Kosina, and S. Selberherr,
``A Numerical Study of Partial-SOI LDMOSFETs,''
in Solid-State Electronics, Vol. 47, No. 2, pp. 275-281, 2003.
- K4
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T. Ayalew, A. Gehring, J.M. Park, T. Grasser, S. Selberherr,
``Improving SiC Lateral DMOSFET Reliability under High Field Stress,''
in Microelectronics Reliability, Vol. 43, Vol. 9-11, pp. 1889-1894, 2003.
- K5
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T. Ayalew, J.M. Park, A. Gehring, T. Grasser, S. Selberherr,
``Silicon Carbide Accumulation-Mode Laterally Diffused MOSFET,''
in Proc. European Solid-State Device Research Conf., pp. 581-584, 2003.
- K6
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C. Heitzinger, A. Sheikholeslami, J.M. Park, S. Selberherr,
``A Method for Generating Structurally Aligned High Quality Grids and its Application to the Simulation of a Trench Gate MOSFET,''
in Proc. European Solid-State Device Research Conf., pp. 457-460, 2003.
- K7
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T. Ayalew, J.M. Park, A. Gehring, T. Grasser, S. Selberherr,
``Modeling and Simulation of SiC MOSFETs,''
in Intl. Conf. on Applied Modelling and Simulation, pp. 552-556, 2003.
- K8
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J.M. Park, T. Grasser, and S. Selberherr,
``High-Voltage Super-Junction SOI-LDMOSFETs with Reduced Drift Length,''
in Proc. of the Eleventh Intl. Symp. on Silicon-On-Insulator Technology and Devices,
pp. 273-282, 2003.
- K9
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J.M. Park, R. Klima, and S. Selberherr,
``Lateral Trench Gate Super-Junction SOI-LDMOSFETs with Low On-Resistance,''
in Proc. European Solid-State Device Research Conf., pp. 283-286, 2002.
- K10
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J.M. Park, R. Klima, and S. Selberherr,
``High-Voltage Lateral Trench Gate SOI LDMOSFETs,''
in Proc. Intl. Seminar on Power Semiconductors, pp. 241-244, 2002.
- K11
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J.M. Park, T. Grasser, H. Kosina, and S. Selberherr,
``Numerical Study of Partial-SOI LDMOSFET Power Devices,''
in Proc. Intl. Semiconductor Device Research Symposium, pp. 114-117, 2001.
Jong-Mun Park
2004-10-28