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4.4 Summary

Numerical device simulation using TCAD software with focus on the drift-diffusion framework has been presented in this chapter. The collection of models show that good simulation results can be obtained for characteristic lengths above $ 200 $ nm. Beside the commonly used parameter models for mobility and for generation/recombination, electron temperature and distribution function estimations have been discussed, which is of crucial importance for hot-carrier modeling.


next up previous contents
Next: 5. Impact-Ionization Generation Up: 4. Device Simulation and Previous: 4.3 Carrier Energy Distribution

O. Triebl: Reliability Issues in High-Voltage Semiconductor Devices