On February 20th, 2023, TU Wien hosted the opening ceremony of the Christian Doppler Laboratory for Multi-Scale Process Modeling of Semiconductor Devices and Sensors. With a panoramic view over historic Vienna at TUtheSky, the director of the new research laboratory Lado Filipovic warmly welcomed the representatives of the TU Wien rectorate, the representatives of the Christian Doppler Forschungsgesellschaft, managers and researchers from the industrial project partner, as well as colleagues and friends working at the TU Wien.
The aim of this research project is to efficiently combine process simulation at extreme time and space scales. This will ensure that novel materials can be properly modeled using a physical and predictive approach, which goes beyond the current semi-empirical methods. Currently, many models are based on calibrated models which were initially built on Silicon fabrication.
This lab is a great cooperation of the Institute for Microelectronics with a global leader in semiconductor TCAD Silvaco Inc. The collaboration will be performed under the umbrella of the Christian Doppler Forschungsgesellschaft.
For more information please see the TU Wien Press Release.
