Our submission to Micromachines
Bobinac, Josip, et al. “Effect of mask geometry variation on plasma etching profiles.” Micromachines 14.3 (2023): 665.
has been has been accepted for publication! In the paper, we calibrate a physical model for SF6/O2 etching and use this to examine the impact of mask geometry variation on the final etched profile. Congratulations to all involved!