The goal of the ADEQUAT-2 project was to develop the following process steps and process modules for the sub-0.5µm CMOS technology generations for logic applications:
- interconnects for 0.35µm CMOS
- device modules for 0.25µm CMOS
The feasibility for the process modules (of generation n) was to be tested and their characteristics stabilised in CMOS batches (of generation n-1). Furthermore, the process know-how was to be transferred to industrial pilot lines with focus on manufacturability and cost issues.
Major Milestones
• Lithography and etching processes for 0.35µm back-end developed.
• Process steps and modules for 0.35µm interconnects documented.
• Lithography and etching processes for 0.25µm front-end developed.
• Front-end processing steps and modules for 0.25µm CMOS developed.
• Fully functional shift register with over 60.000 transistors fabricated using 0.25µm design rules up to metal 1.
• Report on the characterization of front-end process steps and modules for 0.25µm CMOS technology.
ADEQUAT-2 is a follow-up project to ADEQUAT.
