Lado Filipovic is an Associate Professor and the Director of the Christian Doppler Laboratory for Multi-Scale Process Modeling of Semiconductor Devices and Sensors at the Institute for Microelectronics, TU Wien. Lado’s research is centered around Integrated Semiconductor Sensors and Process Technology Computer Aided Design (TCAD). He obtained his venia docendi (habilitation) in Semiconductor Based Integrated Sensors and his doctoral degree (Dr.techn.) in Microelectronics from TU Wien in 2020 and 2012, respectively. He holds a Master’s degree in Applied Sciences (MASc.) from Carleton University in Ottawa, Canada, which he obtained in 2009.

Lado is currently heading several research projects from a wide range of technology readiness levels (TRLs) including basic research – funded by the Austrian Science Fund (FWF); applied research – funded by the Christian Doppler Forschungsgesellschaft (CDG), the Austrian Research Promotion Agency (FFG), and the European Union (EU); and industry research – funded by direct industry collaborations. He is a Senior Member of the IEEE and is an active member of the Technical Program Committee for many outstanding IEEE sponsored conferences. He has served as a reviewer for several European funding agencies, has edited two books on Miniaturized Transistors, and is an active reviewer for many leading journals. His research team has released several open-source scientific software tools under the ViennaTools moniker, such as the process simulator ViennaPS and the device simulator ViennaEMC, which have been applied for studying the fabrication and operation of advanced nanoelectronic devices.

The research group currently collaborates with many industry partners (e.g., Silvaco, Infineon Technologies, Global TCAD Solutions, Fuji Electric) as well as academia from around the world (e.g., MIT, Arizona State University, University of Glasgow, University of Groningen, University of Vienna, Chinese Academy of Sciences). Lado's primary research interest is studying the operation, stability, and reliability of novel semiconductor-based sensors using advanced process and device simulations. An additional pillar of his research is the multi-scale modeling of processes involved in the fabrication of semiconductor devices and sensors. This involves combining atomistic modeling with Monte Carlo and continuum approaches, as well as merging physical and empirical modeling in a single framework, specifically in process TCAD. He is also actively investigating metal oxide semiconductors and novel two-dimensional (2D) materials, e.g., graphene, MoS₂, and phosphorene for the detection of biomarkers and environmental pollutants. In particular, his group is investigating the impact of the adsorption of ambient gas molecules on the surfaces of 2D semiconducting films and on the performance of devices and sensors based on these.

Software Development:

Process Simulator ViennaPS
Ensemble Monte Carlo Simulator ViennaEMC

Research Topics:

Semiconductor Sensors
Process Simulation
Interconnect Reliability
Mechanics of Microelectronics

Running Public Projects:

FWF - Adsorbate-Dependent Conductivity of MoS₂

CDG - CDL for Multi-Scale Process Modeling of Semiconductor Devices and Sensors

Doctoral School: Unravelling Advanced 2D Materials (TU-D)