This deposition model consists of the two reaction steps
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Using the Langmuir adsorption model and assuming that the
decomposition of the surface intermediate determines the rate, the
SiO
deposition rate is given by
A variant of this reaction scheme is the following: If it is assumed that TEOS adsorbs molecularly and that uni-molecular heterogeneous decomposition of adsorbed TEOS determines the rate, then the deposition rate is
Clemens Heitzinger 2003-05-08