ALD | ... | Atomic layer deposition |
---|---|---|
CAD | ... | Computer aided design |
CNT | ... | Carbo-Nanotube |
CORBA | ... | Common Object Request Broker Architecture |
CPU | ... | Central processing unit |
CVD | ... | Chemical vapour deposition |
COO | ... | Cost of ownership |
DD | ... | Drift Diffusion |
DNA | ... | Deoxyribonucleic acid |
ELK | ... | Extreme low- |
ELSA | ... | Enhanced Level-Set Applications |
EOT | ... | Effective oxide thickness |
FET | ... | Field effect transistor |
Gb | ... | Gigabit |
GB | ... | Gigabyte |
GHz | ... | Gigahertz |
GUI | ... | Graphical user interface |
ILD | ... | Interlayer dielectric |
IPD | ... | Inputdeck language |
IT | ... | Information Technoloy |
ITRS | ... | International Technology Roadmap for Semiconductors |
LPCVD | ... | Low pressure chemical vapour deposition |
MC | ... | Monte Carlo |
MTTF | ... | Mean time to failure |
MILP | ... | Mixed integer linear programming |
n-Si | ... | n-doped Silicon |
NFS | ... | Network file system |
NTC | ... | Negative temperature coefficient |
OSG | ... | Organo-silcate glass |
p-Si | ... | p-doped Silicon |
poly | ... | polycrystalline |
... | polycrystalline Silicon | |
PTC | ... | Positive temperature coefficient |
PTFE | ... | Polytetrafluoroethylene |
PZT | ... | Lead Zirkonium Titanate |
RE | ... | Rare earth elements, member of the lanthanoide group {La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu} |
RTD | ... | Resonant tunneling diode |
SEILIB | ... | Simulation Environment Interaction Library |
SEM | ... | Scanning electron microscopy |
SIESTA | ... | Simulation Environment for Semiconductor Technology Analysis |
TCAD | ... | Technology computer aided design |
TEM | ... | Transmission electron microscopy |
TEOS | ... | Tetra-ethoxy-silane, Tetra-ethyl-ortho-silicate: |
VLSI | ... | Very large scale integration |
WSS | ... | Wafer-State-Server: File format for distributed quantities |
XML | ... | Extensible markup language |