References

1

Ch. Pichler and S. Selberherr. Rapid Semiconductor Process Design within the VISTA Framework: Integration of Simulation Tools. In M.H. Hamza, editor, Proceedings of the IASTED International Conference, Modelling and Simulation, pages 147-150, Pittsburgh, PA, USA, 1993. The International Association of Science and Technology for Development.

2

S. Halama, F. Fasching, C. Fischer, H. Kosina, E. Leitner, Ch. Pichler, H. Pimingstorfer, H. Puchner, G. Rieger, G. Schrom, T. Simlinger, M. Stiftinger, H. Stippel, E. Strasser, W. Tuppa, K. Wimmer, and S. Selberherr. The Viennese Integrated System for Technology CAD Applications. In F. Fasching, S. Halama, and S. Selberherr, editors, Technology CAD Systems, pages 197-236, Wien, 1993. Springer.

3

Ch. Pichler and S. Selberherr. Process Flow Representation within the VISTA Framework. In S. Selberherr, H. Stippel, and E. Strasser, editors, Simulation of Semiconductor Devices and Processes, volume 5, pages 25-28, Wien, 1993. Springer.

4

G. Schrom, D. Liu, Ch. Pichler, Ch. Svensson, and S. Selberherr. Analysis of Ultra-Low-Power CMOS with Process and Device Simulation. In C. Hill and P. Ashburn, editors, 24th European Solid State Device Research Conference - ESSDERC'94, pages 679-682, Gif-sur-Yvette Cedex, France, 1994. Editions Frontieres.

5

S. Halama, F. Fasching, C. Fischer, H. Kosina, E. Leitner, P. Lindorfer, Ch. Pichler, H. Pimingstorfer, H. Puchner, G. Rieger, G. Schrom, T. Simlinger, M. Stiftinger, H. Stippel, E. Strasser, W. Tuppa, K. Wimmer, and S. Selberherr. The Viennese Integrated System for Technology CAD Applications. Microelectronics Journal, 26(2/3):137-158, 1995.

6

S. Halama, Ch. Pichler, G. Rieger, G. Schrom, T. Simlinger, and S. Selberherr. VISTA--User Interface, Task Level, and Tool Integration. IEEE Trans.Computer-Aided Design, 14(10):1208-1222, 1995.

7

Ch. Pichler, N. Khalil, G. Schrom, and S. Selberherr. TCAD Optimization Based on Task-Level Framework Services. In H. Ryssel and P. Pichler, editors, Simulation of Semiconductor Devices and Processes, volume 6, pages 70-73, Wien, 1995. Springer.

8

G. Schrom, D. Liu, C. Fischer, Ch. Pichler, Ch. Svensson, and S. Selberherr. VLSI Performance Analysis Method for Low-Voltage Circuit Operation. In G.L. Baldwin, Z. Li, C.C. Tsai, and J. Zhang, editors, Fourth Int. Conf. on Solid-State and Integrated-Circuit Technology, pages 328-330, Beijing, China, 1995.

9

S. Selberherr, C. Fischer, S. Halama, C. Pichler, G. Rieger, G. Schrom, and T. Simlinger. The IC Processes of the Future. In E.J.P. Santos and G.A.S. Machado, editors, Proc. IV Brazilian Microelectronics School, volume I, pages 87-114, Recife, January 1995.

10

H. Stippel, E. Leitner, Ch. Pichler, H. Puchner, E. Strasser, and S. Selberherr. Process Simulation for the 1990s. Microelectronics Journal, 26(2/3):203-215, 1995.

11

C. Pichler, R. Plasun, R. Strasser, and S. Selberherr. Simulation Environment for Semiconductor Technology Analysis. In 1996 International Conference on Simulation of Semiconductor Processes and Devices, pages 147-148, Tokyo, Japan, 1996. Business Center for Academic Societies Japan.

12

G. Schrom, Ch. Pichler, T. Simlinger, and S. Selberherr. On the Lower Bounds of CMOS Supply Voltage. Solid-State Electron., 39(4):425-430, 1996.

13

S. Selberherr, C. Fischer, S. Halama, Ch. Pichler, G. Rieger, G. Schrom, and T. Simlinger. Device structures and device simulation techniques. In G.A.S. Machado, editor, Low-Power HF Microelectronics A Unified Approach, chapter 2, pages 75-83. IEE London, 1996.

14

Ch. Pichler, R. Plasun, R. Strasser, and S. Selberherr. Simulation of complete VLSI Processes with Heterogeneous Simulation Tools. Submitted to IEEE Trans. Computer-Aided Design.

15

Ch. Pichler, R. Plasun, R. Strasser, and S. Selberherr. High-Level TCAD Task Representation and Automation. Submitted to IEEE Trans. Semiconductor Technology Modeling and Simulation.