ASIC Application Specific Integrated Circuit
CA Cellular automat
CD Critical Dimension
CMOS Complementary Metal-Oxide Semiconductor
CMP Chemical Mechanical Planarization
CPU Central Processing Unit
CVD Chemical Vapor Deposition
DOE Design of Experiment
DRAM Dynamic Random-Access Memory
DRM Dipole Rotating Magnet
DUV Deep Ultraviolet
ECAD Electronic Computer Aided Design
FEM Finite Element Method
GUI Graphical User Interface
HDL Hardware Description Languages
HDP High Density Plasma
HPCVD High Pressure Chemical Vapor Deposition
IC Integrated Circuit
ICP Inductively Coupled Plasma
I/O Input/Output
IT Information Technology
LPCVD Low Pressure Chemical Vapor Deposition
MC Monte Carlo
MERIE Magnetically Enhanced Reactive Ion Etching
ODE Ordinary Differential Equation
OPC Optical Proximity Correction
PAC Photo-active Compound
PC Personal Computer
PDE Partial Differential Equation
PE Plasma Enhanced
PED Process File Editor
PFC Perfluorocompound
PSM Phase-Shifting Mask
PVD Physical Vapor Deposition
R&D Research and Development
RF Radio Frequency
RIE Reactive Ion Etching
RSM Response Surface Models
SEM Scanning Electron Microscope
STI Shallow Trench Isolation
TCAD Technology Computer Aided Design
TEOS Tetraethylorthosilicate
WWW World Wide Web
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