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Fig. 7.9 shows the dependence of the transconductance
on
. For
, the
decrease in compact models is attributed to the change of the effective mean
carrier velocity
. As shown in Chapter 3 the term saturated effective mean carrier velocity
is certainly not completely appropriate. Resolving this change in more physical terms the following
factors of influence are found.
- Change of the parasitic modulation, i.e., increased number of electrons
undergoing real space transfer into the barrier due to increased
imposed
fields, which effectively changes the velocity.
- Flattening of the velocity channel profile, which is a
more macroscopic view of the occurring changes of occupation
in k-space due to high fields.
- A thermal effect is found which has triple implications:
- Increase of the resistance of the parasitic parts of
,
, and
, while the external
is
scaled by
.
- Reduction of the barrier mobility, i.e. due to the temperature dependence of the low field mobility, which leads to an
increase of the semiconductor contributions to
and
.
- For higher temperatures
400 K,
which locally can occur, self-conduction of the
semiconductor.
Figure 7.9:
Simulated and measured and
RF- as a function of bias.
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Next: 7.2.2 The Gate Source
Up: 7.2 The Bias Dependence
Previous: 7.2 The Bias Dependence
Quay
2001-12-21