The simplest and fastest way for the calculation of implanted profiles is
the application of distribution functions
(e.g. [Gib68],
[Fur72], [Gib73], [Hof75c]). It is implemented in most
general process simulators, e.g.:
BICEPS [Pen83], COMPOSITE [Lor85],
DIOS [Hün90], FEDSS [Sal83],
ICECREM [Pic90], IMPACT4 [Bac88],
MEMBRE [Mur82],
MIMAS [Paf90], MUSIC [Mij91],
OPUS [Nis89], PEPPER [Mul89],
PREDICT2 [Ros91], PROMIS [Pic85a],
RECIPE [Smi82], ROMANS [Mal83],
SMART-P [Oda88], SPIRIT [Ohg87],
SUPREM III [Ho83b], SUPREM IV [Law88],
TITAN [Ger89].
For the analytical description of implantation profiles it is assumed that
they can be closely approximated by statistical functions. The type of
function 
is assumed a priori, its free parameters are calculated from
theory or fitted to experiments [Rys81], [Jah81],
[Tas89], [Par90].