Biography:
Franz Schanovsky was born in Linz, Austria, in 1981. He studied electrical engineering at the Technische Universität Wien, where he received the degree of Diplomingenieur in 2008. He joined the Institute for Microelectronics in December 2006, where he is presently working on his doctoral degree. His current scientific interests include defects in amorphous SiO2 and at the Si/SiO2 interface and their description using quantum-chemical methods.