- 1
-
D. Adalsteinsson and J.A. Sethian.
A Level Set Approach to a Unified Model for Etching, Deposition, and
Lithography. I: Algorithms and Two-Dimensional Simulations.
J. Comput. Phys., 120(1):128-144, 1995.
- 2
-
D. Adalsteinsson and J.A. Sethian.
A Level Set Approach to a Unified Model for Etching, Deposition, and
Lithography. II: Three-Dimensional Simulations.
J. Comput. Phys., 122(2):348-366, 1995.
- 3
-
D. Adalsteinsson and J.A. Sethian.
A Level Set Approach to a Unified Model for Etching, Deposition, and
Lithography III: Re-Deposition, Re-Emission, Surface Diffusion, and Complex
Simulations.
Technical report, Department of Mathematics and Lawrence Berkeley
Laboratory, University of California, Berkeley, California 94720, August
1997.
- 4
-
D. Adalsteinsson and J.A. Sethian.
A Level Set Approach to a Unified Model for Etching, Deposition, and
Lithography. III: Redeposition, Reemission, Surface Diffusion, and Complex
Simulations.
J. Comput. Phys., 138(1):193-223, 1997.
- 5
-
J.A. Adell, J. de la Cal, and M. San Miguel.
On the Property of Monotonic Convergence for Multivariate
Bernstein-Type Operators.
Journal of Approximation Theory, 80:132-137, 1995.
- 6
-
A.R. Alvarez, B.L. Abdi, D.L. Young, H.D. Weed, J. Teplik, and E.R. Herald.
Application of Statistical Design and Response Surface Methods to
Computer-Aided VLSI Device Design.
IEEE Trans. Computer-Aided Design, 7(2):272-288, 1988.
- 7
-
Semiconductor Industry Association.
The National Technology Roadmap for Semiconductors, 2001.
- 8
-
Avant! Corporation, TCAD Business Unit, Fremont, California, USA.
TSUPREM-4, Two-Dimensional Process Simulation Program, Version
2000.2 User's Manual, February 2000.
- 9
-
E. Bär and J. Lorenz.
3-D Simulation of LPCVD Using Segment-Based Topography
Discretization.
IEEE Trans. Semiconductor Manufacturing, 9(1):67-73, 1996.
- 10
-
T.J. Barth and J.A. Sethian.
Numerical Schemes for the Hamilton-Jacobi and Level Set Equations on
Triangulated Domains.
Technical report, Information Sciences Directorate, NASA Ames
Research Center and Department of Mathematics, University of California,
Berkeley, September 1997.
- 11
-
D. Beasley, D.R. Bull, and R.R. Martin.
An Overview of Genetic Algorithms: Part 2, Research Topics.
University Computing, 15:170-181, 1993.
- 12
-
I.S. Berezin and N.P. Zhidkov.
Computing Methods, volume 1.
Pergamon Press, 1965.
- 13
-
A.D. Bethke.
Genetic Algorithms as Function Optimizers.
PhD thesis, University of Michigan, 1980.
- 14
-
D.M. Betz.
XLISP: An Object-Oriented Lisp, Version 2.1.
Apple, Peterborough, New Hampshire, USA, 1989.
- 15
-
T. Binder.
Rigorous Integration of Semiconductor Process and Device
Simulators.
Dissertation, Technische Universität Wien, 2002.
to be published.
- 16
-
T. Binder, K. Dragosits, T. Grasser, R. Klima, M. Knaipp, H. Kosina, R. Mlekus,
V. Palankovski, M. Rottinger, G. Schrom, S. Selberherr, and M. Stockinger.
MINIMOS-NT User's Guide.
Institut für Mikroelektronik, 1998.
- 17
-
T. Binder and S. Selberherr.
Object-Oriented Design Patterns for Process Flow Simulations.
In M.H .Hamza, editor, Proc. 4th Annual IASTED International
Conference on Software Engineering and Applications, pages 159-166, Las
Vegas, Nevada, USA, November 2000.
- 18
-
T. Binder and S. Selberherr.
Object-Oriented Wafer-State Services.
In R.V. Landeghem, editor, Proc. 14th European Simulation
Multiconference (ESM), pages 360-364, Ghent, Belgium, May 2000.
- 19
-
J. Bloomer.
Power Programming with RPC.
O'Reilly & Associates, 1992.
- 20
-
D.S. Boning and P.K. Mozumder.
DOE/Opt: A System for Design of Experiments, Response Surface
Modeling, and Optimization Using Process and Device Simulation.
IEEE Trans. Semiconductor Manufacturing, 7(2):233-244, 1994.
- 21
-
G.E.P. Box and N.R. Draper.
Empirical Model-Building and Response Surfaces.
Wiley, New York, 1987.
- 22
-
I.N. Bronstein, K.A. Semendjajew, G. Musiol, and H. Mülig.
Taschenbuch der Mathematik.
Verlag Harri Deutsch, Thun, 5th edition, 2001.
- 23
-
R. Cartuyvels, R. Booth, S. Kubicek, L. Dupas, and K.M. De Meyer.
A Powerful TCAD System Including Advanced RSM Techniques for
Various Engineering Optimization Problems.
In Selberherr et al. [116], pages 29-32.
- 24
-
J.A. Cornell.
How to Apply Response Surface Methodology.
American Society for Quality Control, Milwaukee, Wisconsin, second
edition, 1990.
- 25
-
M.G. Crandall, L.C. Evans, and P.-L. Lions.
Some Properties of Viscosity Solutions of Hamilton-Jacobi
Equations.
Trans. Amer. Math. Soc., 282:487-502, 1984.
- 26
-
M.G. Crandall and P.-L. Lions.
Viscosity Solutions of Hamilton-Jacobi Equations.
Trans. Amer. Math. Soc., 277:1-42, 1983.
- 27
-
J. Daniell and S.W. Director.
An Object-Oriented Approach to CAD Tool Control.
IEEE Trans. Computer-Aided Design, 10(6):698-713, June 1991.
- 28
-
F.H. Dill, A.R. Neureuther, J.A. Tuttle, and E.J. Walker.
Modeling Projection Printing of Positive Photoresists.
IEEE Trans. Electron Devices, ED-22(7):456-464, 1975.
- 29
-
R.W. Dutton and Z. Yu.
Technology CAD - Computer Simulation of IC Processes and
Devices.
Kluwer, 1993.
- 30
-
D.J. Eaglesham, P.A. Stolk, H.J. Gossmann, and J.M. Poate.
Implantation and Transient B Diffusion in Si: The Source of
Interstitials.
Appl. Phys. Lett., 65(18):2305-2307, 1994.
- 31
-
B. Engquist and S. Osher.
Stable and Entropy Satisfying Approximations for Transonic Flow
Calculations.
Math. Comp., 34:45-75, 1980.
- 32
-
E. Anderson et al.
LAPACK Users' Guide.
SIAM, 1999.
- 33
-
F. Fasching.
The Viennese Integrated System for Technology CAD
Applications-Data Level Design and Implementation.
Dissertation, Technische Universität Wien, 1994.
http://www.iue.tuwien.ac.at/phd/fasching.
- 34
-
F. Fasching, C. Fischer, S. Selberherr, H. Stippel, W. Tuppa, and H. Read.
A PIF Implementation for TCAD Purposes.
In W. Fichtner and D. Aemmer, editors, Simulation of
Semiconductor Devices and Processes, volume 4, pages 477-482, Konstanz,
1991. Hartung-Gorre.
- 35
-
Y.Y. Feng and J. Kozak.
Asymptotic Expansion Formula for Bernstein Polynomials Defined on a
Simplex.
Constructive Approximation, 8:49-58, 1992.
- 36
-
L.J. Fogel, A.J. Owens, and M.J. Walsh.
Artificial Intelligence through Simulated Evolution.
John Wiley, Chichester, UK, 1966.
- 37
-
J. Gablonsky.
An Implementation of the DIRECT Algorithm.
Technical report, Department of Mathematics, North Carolina State
University, 1998.
http://www4.ncsu.edu/eos/users/c/ctkelley/www/optimization_codes.html.
- 38
-
G.J. Gaston and A.J. Walton.
The Integration of Simulation and Response Surface Methodology for
the Optimization of IC Processes.
IEEE Trans. Semiconductor Manufacturing, 7(1):22-33, 1994.
- 39
-
C.R. Giardina and E.R. Dougherty.
Morphological Methods in Image and Signal Processing.
Prentice-Hall, New Jersey, 1988.
- 40
-
D.E. Goldberg.
Genetic Algorithms in Search, Optimization and Machine
Learning.
Addison-Wesley, 1989.
- 41
-
P. Graham.
ANSI Common Lisp.
Prentice Hall, New Jersey, 1996.
- 42
-
S. Halama.
The Viennese Integrated System for Technology CAD
Applications-Architecture and Critical Software Components.
Dissertation, Technische Universität Wien, 1994.
http://www.iue.tuwien.ac.at/phd/halama.
- 43
-
G.H. Hardy, J.E. Littlewood, and G. Pólya.
Inequalities.
Cambridge University Press, Cambridge, reprint of 2nd edition
edition, 1988.
- 44
-
A. Harten, B. Engquist, S. Osher, and S. Chakravarthy.
Uniformly High Order Accurate Essentially Non-Oscillatory Schemes.
III.
J. Comput. Phys., 71(2):231-303, 1987.
- 45
-
C. Heitzinger and S. Selberherr.
An Extensible TCAD Optimization Framework Combining
Gradient Based and Genetic Optimizers.
In Proc. SPIE International Symposium on Microelectronics and
Assembly: Design, Modeling, and Simulation in Microelectronics, pages
279-289, Singapore, 2000.
- 46
-
J. Helmsen, E. Scheckler, A. Neureuther, and C. Séquin.
An Efficient Loop Detection and Removal Algorithm for 3D
Surface-Based Lithography Simulation.
In Proc. NUPAD 1992 - International Workshop on Numerical
Modeling of Processes and Devices for Integrated Circuits, pages 3-8, 1992.
- 47
-
H. Heuser.
Lehrbuch der Analysis. Teil 2.
B.G. Teubner, Stuttgart, 11th edition, 2000.
- 48
-
R.J. Hoekstra, M.J. Kushner, Ph. Schoenborn, and V. Sukharev.
Microtrenching Resulting from Specular Reflection during Chlorine
Etching of Silicon.
J. Vac. Sci. Technol. B, 16(4):2102-2104, 1998.
- 49
-
J.H. Holland.
Adaption in Natural and Artificial Systems.
University of Michigan Press, 1975.
- 50
-
A. Hössinger, E. Langer, and S. Selberherr.
Parallelization of a Monte Carlo Ion Implantation Simulator.
IEEE Trans. Computer-Aided Design of Integrated Circuits and
Systems, 19(5):560-567, May 2000.
- 51
-
A. Hössinger, M. Radi, B. Scholz, T. Fahringer, E. Langer, and
S. Selberherr.
Parallelization of a Monte-Carlo Ion Implantation Simulator for
Three-Dimensional Crystalline Structures.
In SISPAD'99 [124], pages 103-106.
- 52
-
A. Hössinger, S. Selberherr, M. Kimura, I. Nomachi, and S. Kusanagi.
Three-Dimensional Monte-Carlo Ion Implantation Simulation for
Molecular Ions.
In Electrochemical Society Proceedings, volume 99-2, pages
18-25, 1999.
- 53
-
Z.-K. Hsiau, E.C. Kan, J.P. McVittie, and R.W. Dutton.
Robust, Stable, and Accurate Boundary Movement for Physical Etching
and Deposition Simulation.
IEEE Trans. Electron Devices, 44(9):1375-1385, September 1997.
- 54
-
N. Ikeda, T.Terano, H. Moriya, T. Emori, and T. Kobayashi.
A Novel Logic Compatible Gain Cell with two Transistors and one
Capacitor.
In Symposium on VLSI Technology Digest of Technical Papers,
pages 168-169, 2000.
- 55
-
L. Ingber.
Adaptive Simulated Annealing.
http://www.ingber.com/#ASA-CODE, 1993.
- 56
-
ISE Integrated Systems Engineering.
DIOS Manual, ISE TCAD Release 7.5, 2001.
- 57
-
R. Jewett, P. Hagouel, A. Neureuther, and T. van Duzer.
Line-Profile Resist Development Simulation Techniques.
Polymer Engineering and Science, 17:381-384, 1977.
- 58
-
D.R. Jones, C.D. Perttunen, and B.E. Stuckmann.
Lipschitzian Optimization without the Lipschitz Constant.
J. Optimization Theory Appl., 79(1):157-181, 1993.
- 59
-
K.A. De Jong, editor.
Evolutionary Computation.
journal published by MIT Press, 1993.
- 60
-
W. Kanert, N. Krischke, and K. Wiesinger.
Optimization of DMOS Transistors for Smart Power Technologies by
Simulation and Response Surface Methods.
In Selberherr et al. [116], pages 213-216.
- 61
-
C.T. Kelley.
Iterative Methods for Optimization.
SIAM, Philadelphia, 1999.
- 62
-
H. Kosina.
Computer-Aided Engineering: Technology and Devices, 1998.
lecture notes.
- 63
-
J.R. Koza.
Genetic Programming.
MIT Press, Cambridge, MA, 1992.
- 64
-
P.D. Lax.
Hyperbolic Systems of Conservation Laws and the Mathematical
Theory of Shock Waves.
Society for Industrial and Applied Mathematics, Philadelphia, PA,
1973.
Conference Board of the Mathematical Sciences Regional Conference
Series in Applied Mathematics, No. 11.
- 65
-
C. Ledl.
Konvertierung rasterorienter Geometrien in polygonal begrenzte.
Diplomarbeit, Technische Universität Wien, 1994.
- 66
-
R.J. LeVeque.
Numerical Methods for Conservation Laws.
Birkhäuser, Basel, 2nd edition, 1992.
- 67
-
G.G. Lorentz.
Bernstein Polynomials.
Chelsea Publishing Company, New York, 2nd edition, 1986.
- 68
-
J. Lorenz, B. Baccus, and W. Henke.
Three-Dimensional Process Simulation.
Microelectronic Engineering, 34(1):85-100, 1996.
- 69
-
R. Malladi and J.A. Sethian.
Image Processing via Level Set Curvature Flow.
Proc. Nat. Acad. Sci. U.S.A., 92(15):7046-7050, 1995.
- 70
-
R. Malladi and J.A. Sethian.
Image Processing: Flows under Min/Max Curvature and Mean Curvature.
Graphical Models and Image Processing, 58(2):127-141, 1996.
- 71
-
R. Malladi, J.A. Sethian, and B.C. Vemuri.
A Fast Level Set Based Algorithm for Topology-Independent Shape
Modeling.
J. Math. Imaging Vision, 6(2-3):269-290, 1996.
- 72
-
R. Malladi, J.A. Sethian, and B.C. Vermuri.
Shape Modeling with Front Propagation: A Level Set Approach.
IEEE Trans. on Pattern Analysis and Machine Intelligence,
17(2):158-175, 1995.
- 73
-
D.W. Marquardt.
An Algorithm for the Estimation of Nonlinear Parameters.
Soc. Ind. Appl. Maths. J., 11:431-441, 1963.
- 74
-
H. Masuda, F. Otsuka, Y. Aoki, S. Sato, and S. Shimada.
Response Surface Methods for Submicron MOSFETs Characterization
with Variable Transformation Technology.
IEICE Trans., E 74(6):1621-1633, 1991.
- 75
-
J. McCarthy.
Recursive Functions of Symbolic Expressions and their Computation by
Machine (Part I).
Comm. ACM, 3:184-195, 1960.
- 76
-
J. McCarthy.
Lisp 1.5 Programmer's Manual.
MIT Press, 1962.
- 77
-
Z. Michalewicz.
Genetic Algorithms + Data Structures = Evolution Programs.
Springer, Berlin, 1996.
- 78
-
A. Misaka and K. Harafuji.
Simulation Study of Micro-Loading Phenomena in Silicon Dioxide Hole
Etching.
IEEE Trans. Electron Devices, 44(5):751-760, 1997.
- 79
-
R. Mlekus, Ch. Ledl, E. Strasser, and S. Selberherr.
Polygonal Geometry Reconstruction after Cellular Etching or
Deposition Simulation.
In H. Ryssel and P. Pichler, editors, Simulation of
Semiconductor Devices and Processes, volume 6, pages 50-53, Wien, Austria,
1995. Springer.
- 80
-
G.E. Moore.
Cramming More Components onto Integrated Circuits.
Electronics, pages 114-117, April 1965.
- 81
-
J.J. Moré, B.S. Garbow, and K.E. Hillstrom.
Users Guide for MINPACK-1, 1980.
Argonne National Laboratory Report ANL-80-74, Argone, IL.
- 82
-
J.J. Moré, D.C. Sorensen, K.E. Hillstrom, and B.S. Garbow.
The MINPACK Project.
Sources and Development of Mathematical Software. Prentice-Hall,
Englewood Clifs, NJ, USA, 1984.
- 83
-
A.R. Neureuther.
IC Process Modeling and Topography Design.
Proc. IEEE, 71(1):121-128, January 1983.
- 84
-
Y. Nishi and R. Doering.
Handbook of Semiconductor Manufacturing Technology.
Marcel Dekker, Inc., 2000.
- 85
-
W.G. Oldham, S.N. Nandgaonkar, A.R. Neureuther, and M. O'Toole.
A General Simulator for VLSI Lithography and Etching Processes:
Part I-Application to Projection Lithography.
IEEE Trans. Electron Devices, ED-26(4):717-722, 1979.
- 86
-
W.G. Oldham, A.R. Neureuther, C. Sung, J.L. Reynolds, and S.N. Nandgaonkar.
A General Simulator for VLSI Lithography and Etching Processes:
Part II-Application to Deposition and Etching.
IEEE Trans. Electron Devices, ED-27(8):1455-1459, 1980.
- 87
-
S. Osher and J.A. Sethian.
Fronts Propagating with Curvature-Dependent Speed: Algorithms Based
on Hamilton-Jacobi Formulations.
J. Comput. Phys., 79(1):12-49, 1988.
- 88
-
S. Osher and C. Shu.
High-Order Essentially Nonoscillatory Schemes for
Hamilton-Jacobi Equations.
SIAM J. Numer. Anal., 28(4):907-922, 1991.
- 89
-
P.L. O'Sullivan, F.H. Baumann, and G.H. Gilmer.
Numerical Simulation of Sputter Deposition and Etching in Trenches
Using the Level Set Technique.
In Proc. 2nd Intl. Conf. on Modeling and Simulation of
Microsystems, pages 449-451, San Juan, Puerto Rico, USA, April 1999.
- 90
-
Ch. Pichler.
Integrated Semiconductor Technology Analysis.
Dissertation, Technische Universität Wien, March 1997.
http://www.iue.tuwien.ac.at/phd/pichler.
- 91
-
S.A. Piyawskii.
An Algorithm for Finding the Absolute Extremum of a Function.
USSR Computational Mathematics and Mathematical Physics,
12:57-67, 1972.
- 92
-
R. Plasun.
Optimization of VLSI Semiconductor Devices.
Dissertation, Technische Universität Wien, 1999.
http://www.iue.tuwien.ac.at/phd/plasun.
- 93
-
R. Plasun, Ch. Pichler, T. Simlinger, and S. Selberherr.
Optimization Tasks in Technology CAD.
In W. Hahn and A. Lehmann, editors, 9th European Simulation
Symposium, pages 445-449, Passau, Germany, October 1997. Society for
Computer Simulation International.
- 94
-
R. Plasun, M. Stockinger, R. Strasser, and S. Selberherr.
Simulation Based Optimization Environment and its Application to
Semiconductor Devices.
In Intl. Conf. on Applied Modelling and Simulation, pages
313-316, Honolulu, Hawaii, USA, August 1998.
- 95
-
J.M. Poate, D.J. Eaglesham, G.H. Gilmer, J.-J. Gossmann, M. Jaraiz, C.S.
Rafferty, and P.A. Stolk.
Ion Implantation and Transient Enhanced Diffusion.
In Proc. Intl. Electron Devices Meeting, pages 77-80,
Washington, DC, USA, 1995.
- 96
-
T. Popoviciu.
Sur l'Approximation des Fonctions Convexes d'Ordre Supérieur.
Mathematica, 10:49-54, 1935.
- 97
-
W. Pyka.
Feature Scale Modeling for Etching and Deposition Processes in
Semiconductor Manufacturing.
Dissertation, Technische Universität Wien, 2000.
http://www.iue.tuwien.ac.at/phd/pyka.
- 98
-
W. Pyka, C. Heitzinger, N. Tamaoki, T. Takase, T. Ohmine, and S. Selberherr.
Monitoring Arsenic In-Situ Doping with Advanced Models for
Poly-Silicon CVD.
In Simulation of Semiconductor Processes and Devices, pages
124-127, Athens, Greece, September 2001.
- 99
-
C.S. Rafferty, G.H. Gilmer, J. Jaraiz, D. Eaglesham, and H.-J. Gossmann.
Simulation of Cluster Evaporation and Transient Enhanced Diffusion in
Silicon.
Appl. Phys. Lett., 68(17):2395-2397, April 1996.
- 100
-
G.B. Raupp, F.A. Shemansky, and T.S. Cale.
Kinetics and Mechanism of Silicon Dioxide Deposition Through Thermal
Pyrolysis of Tetraethoxysilane.
J. Vac. Sci. Technol. B, 10(6):2422-2430, November 1992.
- 101
-
I. Rechenberg.
Evolutionsstrategie: Optimierung technischer Systeme nach
Prinzipien der biologischen Evolution.
Frommann-Holzboog Verlag, Stuttgart, 1973.
- 102
-
R.A. Rutenbar.
Simulated Annealing Algorithms: An Overview.
IEEE Circuits & Devices, pages 19-26, January 1989.
- 103
-
H. Sato, K. Tsuneno, K. Aoyama, T. Nakamura, H. Kunitomo, and H. Masuda.
A New Hierarchical RSM for TCAD-based Device Design to Predict CMOS
Development.
In Proc. IEEE 1995 Int. Conf. on Microelectronic Test
Structures, volume 8, pages 299-302, March 1995.
- 104
-
E. Scheckler.
Algorithms for Three-Dimensional Simulation of Etching and
Deposition Processes in Integrated Circuit Fabrication.
PhD thesis, University of California, Berkeley, CA, USA, 1991.
- 105
-
E. Scheckler, N. Tam, A. Pfau, and A. Neureuther.
An Efficient Volume-Removal Algorithm for Practical Three-Dimensional
Lithography Simulation with Experimental Verification.
IEEE Trans. Computer-Aided Design, 12(9):1345-1356, 1993.
- 106
-
E.W. Scheckler and A.R. Neureuther.
Models and Algorithms for Three-Dimensional Topography Simulation
with SAMPLE-3D.
IEEE Trans. Computer-Aided Design, 13(2):219-230, 1994.
- 107
-
E.W. Scheckler, K.K.H. Toh, D.M. Hoffstetter, and A.R. Neureuther.
3D Lithography, Etching, and Deposition Simulation (SAMPLE-3D).
In Symposium on VLSI Technology, pages 97-98, Oiso, Japan,
1991.
- 108
-
R. Schnabl.
Eine Verallgemeinerung der Bernsteinpolynome.
Math. Ann., 179:74-82, 1968.
- 109
-
I.J. Schoenberg.
On Variation Diminishing Approximation Methods.
In R.E. Langer, editor, On Numerical Approximation, pages
249-274, Madison, 1959. The University of Wisconsin Press.
- 110
-
B. Schubert.
A Sequential Method Seeking the Global Maximum of a Function.
SIAM J. Numer. Anal., 9:379-388, 1972.
- 111
-
G. Schumicki and P. Seegebrecht.
Prozeßtechnologie.
Springer, 1991.
- 112
-
H.-P. Schwefel.
Numerical Optimization for Computer Models.
John Wiley, Chichester, UK, 1981.
- 113
-
R. Sedgewick.
Algorithms in C.
Addison-Wesley, 1990.
- 114
-
S. Selberherr.
Analysis and Simulation of Semiconductor Devices.
Springer, Wien, New York, 1984.
- 115
-
S. Selberherr, W. Fichtner, and H. Pötzl.
MINIMOS - A Program Package to Facilitate MOS Device Design and
Analysis.
In B.T. Browne and J.J. Miller, editors, Numerical Analysis of
Semiconductor Devices and Integrated Circuits, volume I, pages 275-279,
Dublin, 1979. Boole Press.
- 116
-
S. Selberherr, H. Stippel, and E. Strasser, editors.
Simulation of Semiconductor Devices and Processes, volume 5,
Wien, 1993. Springer.
- 117
-
V. Senez, T. Hoffmann, and A. Tixier.
Calibration of a Two-Dimensional Numerical Model for the Optimization
of LOCOS-Type Isolations by Response Surface Methodology.
IEEE Trans. Semiconductor Manufacturing, 13(4):416-426,
November 2000.
- 118
-
J.A. Sethian.
Curvature Flow and Entropy Conditions Applied to Grid Generation.
J. Comput. Phys., 115(2):440-454, 1994.
- 119
-
J.A. Sethian.
A Fast Marching Level Set Method for Monotonically Advancing Fronts.
Proc. Nat. Acad. Sci. U.S.A., 93(4):1591-1595, 1996.
- 120
-
J.A. Sethian.
Theory, Algorithms, and Applications of Level Set Methods for
Propagating Interfaces.
Acta Numer., 5:309-395, 1996.
- 121
-
J.A. Sethian.
Level Set Methods and Fast Marching Methods.
Cambridge University Press, Cambridge, 1999.
- 122
-
J.A. Sethian.
Level Set Methods and Fast Marching Methods.
Cambridge University Press, Cambridge, 1999.
- 123
-
T. Simlinger, H. Kosina, M. Rottinger, and S. Selberherr.
MINIMOS-NT: A Generic Simulator for Complex Semiconductor
Devices.
In H.C. de Graaff and H. van Kranenburg, editors, 25th European
Solid State Device Research Conference, pages 83-86, Gif-sur-Yvette Cedex,
France, 1995. Editions Frontieres.
- 124
-
Proc. Simulation of Semiconductor Processes and Devices, Kyoto, Japan,
September 1999.
- 125
-
D.L. Smith, B. Wacker, S.E. Ready, C.C. Chen, and A.S. Alimonda.
Mechanism of SiNH Deposition from NH-SiH Plasma.
J. Electrochem. Soc., 137:614-623, February 1990.
- 126
-
G.D. Smith.
Numerical Solution of Partial Differential Equations: Finite
Difference Methods.
Clarendon Press, Oxford, 1978.
- 127
-
G. Sod.
Numerical Methods in Fluid Dynamics: Initial and
Initial-Boundary Value Problems.
Cambridge University Press, Cambridge, 1985.
- 128
-
P. Spellucci.
Donlp2 Users Guide.
Part of the netlib project, 1995.
- 129
-
P. Spellucci.
Solving General Convex QP Problems via an Exact Quadratic Augmented
Lagrangian with Bound Constraints.
http://www.mathematik.th-darmstadt.de/ags/ag8/spellucci, June
1996.
- 130
-
Proc. First Intl. Workshop on Statistical Metrology, Honolulu, 1996.
- 131
-
H. Stippel, Ph. Lindorfer, and J. Weintraub.
Response Surface Method for Statistical Process and Device
Simulation.
In StatMetWS'96 [130].
- 132
-
M. Stockinger.
Optimization of Ultra-Low-Power CMOS Transistors.
Dissertation, Technische Universität Wien, 2000.
- 133
-
M. Stockinger, A. Wild, and S. Selberherr.
Closed-Loop MOSFET Doping Profile Optimization for Portable
Systems.
In Proc. 2nd Intl. Conf. on Modeling and Simulation of
Microsystems, pages 411-414, San Juan, Puerto Rico, USA, April 1999.
- 134
-
E. Strasser.
Simulation von Topographieprozessen in der Halbleiterfertigung.
Dissertation, Technische Universität Wien, 1994.
http://""www.""iue.""tuwien.""ac.""at/""phd/""strasser.
- 135
-
E. Strasser, G. Schrom, K. Wimmer, and S. Selberherr.
Accurate Simulation of Pattern Transfer Processes Using Minkowski
Operations.
IEICE Trans. Electron., E77-C(2):92-97, 1994.
- 136
-
E. Strasser and S. Selberherr.
A General Simulation Method for Etching and Deposition Processes.
In Selberherr et al. [116], pages 357-360.
- 137
-
E. Strasser and S. Selberherr.
Algorithms and Models for Cellular Based Topography Simulation.
IEEE Trans. Computer-Aided Design, 14(9):1104-1114, 1995.
- 138
-
E. Strasser, K. Wimmer, and S. Selberherr.
A New Method for Simulation of Etching and Deposition Processes.
In Intl. Workshop on VLSI Process and Device Modeling, pages
54-55, Nara, Japan, 1993.
- 139
-
R. Strasser.
Rigorous TCAD Investigations on Semiconductor Fabrication
Technology.
Dissertation, Technische Universität Wien, 1999.
http://www.iue.tuwien.ac.at/phd/strasser.
- 140
-
R. Strasser, R. Plasun, and S. Selberherr.
Practical Inverse Modeling with SIESTA.
In SISPAD'99 [124], pages 91-94.
- 141
-
S. Tazawa, K. Ochiai, S. Matsuo, and S. Nakajima.
A High-Speed 2-D Topography Simulator Based on a Pixel Model.
IEEE Trans. Computer-Aided Design, 16(4):386-397, 1997.
- 142
-
K. Toh.
Algorithms for Three-Dimensional Simulation of Photoresist
Development.
PhD thesis, University of California, Berkeley, CA, USA, 1990.
- 143
-
K.K.H. Toh, A.R. Neureuther, and E.W. Scheckler.
Algorithms for Simulation of Three-Dimensional Etching.
IEEE Trans. Computer-Aided Design, 13(5):616-624, 1994.
- 144
-
Y.-F. Tsai and R.T. Farouki.
Algorithm 812: BPOLY: An Object-Oriented Library of Numerical
Algorithms for Polynomials in Bernstein Form.
ACM Trans. Mathematical Software, 27(2):267-296, June 2001.
- 145
-
M. Wall.
GAlib: A C++ Genetic Algorithm Library.
http://lancet.mit.edu/ga/, 1994.
- 146
-
T.G. Waring, A.J. Walton, S. Ferguson, and D. Sprevak.
Application of Covariance Structures to Improve the Fit of Response
Surfaces to Simulation Data.
IEEE Trans. Semiconductor Manufacturing, 12(3):366-374, 1999.
- 147
-
J. Watson and F. Crick.
Molecular Structure of Nucleic Acids.
Nature, 171:737-738, April 1953.
- 148
-
M. Welten, R. Clancy, M. Murphy, and W. Lane.
Total DFM Approach for a 0.6m CMOS Process.
In StatMetWS'96 [130].
- 149
-
S. Wolfram.
The Mathematica Book.
Cambridge University Press, Cambridge, 4th edition, 1999.
- 150
-
S. Yamamoto, T. Kure, M. Ohgo, T. Matsuzama, S. Tachi, and H. Sunami.
A Two-Dimensional Etching Profile Simulator: ESPRIT.
IEEE Trans. Computer-Aided Design, CAD-6(3):417-422, 1987.
- 151
-
D. Zhang and M.J. Kushner.
Mechanisms for CF Radical Generation and Loss on Surfaces in
Fluorocarbon Plasmas.
J. Vac. Sci. Technol. A, 18(6):2661-2668, 2000.
- 152
-
D. Zhang and M.J. Kushner.
Surface Kinetics and Plasma Equipment Model for Si Etching by
Fluorocarbon Plasmas.
J. Appl. Phys., 87(3):1060-1069, February 2000.
- 153
-
D. Zhang and M.J. Kushner.
Investigations of Surface Reactions during CF Plasma Etching
of SiO with Equipment and Feature Scale Models.
J. Vac. Sci. Technol. A, 19(2):524-538, 2001.
- 154
-
H.-K. Zhao, T. Chan, B. Merriman, and S. Osher.
A Variational Level Set Approach to Multiphase Motion.
J. Comput. Phys., 127(1):179-195, 1996.
All dissertations of the Institute for
Microelectronics, Technische Universität Wien, Austria, are
available at http://www.iue.tuwien.ac.at/.
Subsections
Clemens Heitzinger
2003-05-08