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An ion implantation process is mainly determined by five process parameters.
- Dopant species
- Ion beam energy
- Implantation dose
- Tilt and twist angle
Subsections
Previous: 2.1 Implanter Techniques
Up: 2. Ion Implantation Technology
Next: 2.2.1 Dopant Species
A. Hoessiger: Simulation of Ion Implantation for ULSI Technology