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1.1.7 Diffusion
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Dissertation A. Hoessinger
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2.1 Implanter Techniques
2. Ion Implantation Technology
Subsections
2.1 Implanter Techniques
2.2 Ion Implantation Process Parameters
2.2.1 Dopant Species
2.2.2 Ion Beam Energy
2.2.3 Implantation Dose
2.2.4 Tilt and Twist Angle
2.3 Target Materials Properties
2.3.1 Crystalline Silicon
2.3.2 Polycrystalline Silicon
2.3.3 Silicon Dioxide
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1.1.7 Diffusion
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Dissertation A. Hoessinger
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2.1 Implanter Techniques
A. Hoessiger: Simulation of Ion Implantation for ULSI Technology
Previous: 1.1.7 Diffusion
Up: Dissertation A. Hoessinger
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Previous: 1.1.7 Diffusion
Up: Dissertation A. Hoessinger
Next: 2.1 Implanter Techniques