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6.6 Comparison with a Two-Dimensional Simulation

The LOCOS structure shown in Fig. 6.3 is in principle a two-dimensional structure with a 0.4$ \mu $m stripped mask. Therefore, the three-dimensional simulation results from FEDOS can be compared with a two-dimensional oxidation simulation. For the stress dependent simulation with FEDOS a wet oxidation with a period of 20 minutes at 1000$ ^{\circ }$C was assumed. The same parameters are used for an oxidation simulation on an equivalent two-dimensional structure with the commercial process simulation program DIOS [14]. The DIOS output is shown in Fig. 6.15. As illustrated in Fig. 6.10 the results from FEDOS are in good agreement with DIOS.

Figure 6.15: Two-dimensional oxidation simulation with DIOS.
\includegraphics[width=0.7\linewidth]{/iuehome/hollauer/dios/screenlocos1c.ps}


next up previous contents
Next: 7. Stress Dependent Oxidation Up: 6. Simulation of Thermal Previous: 6.5 Model Calibration

Ch. Hollauer: Modeling of Thermal Oxidation and Stress Effects