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Dissertation Gerhard Karlowatz
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Contents
1. Introduction
2. Strain Related Effects on the Band Structure
2.1 Definition of Stress
2.2 Definition of Strain
2.3 Stress-Strain Relations
2.3.1 Notation of Planes and Directions in a Crystal
2.3.2 Stress Applied Along Symmetry Directions
2.4 Configuration of the Diamond Structure
2.5 The Strained Diamond Structure
2.5.1 The Point Group Symmetry Operations
2.6 The Reciprocal Lattice
2.6.1 The Relaxed Diamond Structure:
Symmetry
2.6.2 The Biaxially Strained Diamond Structure:
Symmetry
2.6.3 D
Symmetry
2.6.4
Symmetry
2.6.5 Utilizing Symmetry Properties in Monte Carlo Simulation
3. The Semiclassical Transport Model
3.1 The Equations of Motion
3.2 The Boltzmann Transport Equation
3.3 Scattering Mechanisms
3.3.1 Phonon Scattering
3.3.2 Ionized Impurity Scattering
3.3.3 Impact Ionization
4. Monte Carlo Technique
4.1 Random Numbers: Direct and Indirect Method
4.2 Piecewise Constant Gamma Scheme
4.3 Self-Scattering Scheme for Ionized Impurity Scattering
4.4 Selecting a k-vector after Scattering
4.5 Meshing of the Brillouin Zone
4.6 Calculating the DOS
4.7 Precalculated Values related to the Mesh Structure
4.8 Selfconsistent Monte Carlo Scheme
5. Results
5.1 The Conduction Band Structure of Strained Si
5.1.1 Valley splitting
5.1.2 Effective mass change
5.2 Low Field Electron Mobility of Strained Si
5.3 High Field Electron Mobility of Strained Si
5.4 The Valence Band Structure of Strained Ge
5.4.1 Band splitting
5.4.2 Effective mass change
5.5 Low Field Mobility of Holes in Strained Ge
5.6 High Field Mobility of Holes in Strained Ge
6. Simulation of Blocked Impurity Band Devices
6.1 Introduction
6.2 Operation of BIB Detectors
6.3 Hopping Conduction
6.4 Monte Carlo Simulation of BIB Detectors
6.4.1 Neutral Impurity Scattering
6.4.2 Non-Markovian Impact Ionization Model
6.5 Results
6.5.1 Electrostatic Field
6.5.2 BIB Device as a Single Photon Counter
7. Summary and Conclusions
Bibliography
Own Publications
Next:
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Dissertation Gerhard Karlowatz
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G. Karlowatz: Advanced Monte Carlo Simulation for Semiconductor Devices