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Up: 2 Analytical Ion Implantation
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Modeling of multilayer structures is of major interest. Nitride and silicon
dioxide are often used as padding layers to mask the silicon surface or to
randomize the ion beam to avoid channeling of the ions. Up to now, several
numerical methods have been proposed [Wie89] [Lor90].
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Fri Jul 5 17:07:46 MET DST 1996