The decision, whether to use the Monte Carlo simulation method or the analytical ion implantation method, is a trade-off between CPU time consumption and accuracy. The results obtained from Monte Carlo calculations are based on probability decisions, hence the accuracy is limited within two or three orders of magnitudes. The analytical method allows a more realistic dopant profile description over the whole concentration range, but it cannot cover physical effects like reflection of particles at the simulation boundaries. Figure 2.3-1 shows the two-dimensional result of a phosphorus implantation at 70keV and 30 degrees tilt angle. Comparing our analytical results with Monte Carlo simulations (see Fig. 2.3-2) we found good agreement. Due to the neglection of the reflected particles in the mask sidewall region, the analytical method yields a lower peak concentration in the silicon substrate. One major drawback of the Monte Carlo ion implantation method is the enormous CPU time consumption for amorphous and even for crystalline calculations. For a simple structure like that shown in Figure 2.3-1 a two-dimensional crystalline Monte Carlo simulation would consume approximately times the CPU time of the analytical method. By performing a two-dimensional amorphous Monte Carlo simulation this CPU time ratio is reduced by one magnitude ( ). Therefore, the Monte Carlo method is not suitable for optimization purposes, where several hundred implantations have to be simulated within reasonable time.
Figure 2.3-1: Two-dimensional phosphorus implantation
profile obtained by the analytical ion implantation method at 70 keV
energy, dose, and tilt angle. Due to
neglection of reflective particles the sidewall mask concentration is
underestimated.
Figure 2.3-2: Two-dimensional phosphorus
implantation profile obtained from the amorphous Monte Carlo ion
implantation method at 70 keV energy, dose, and
tilt angle. The simulation was performed using 50.000 distinct
ions and consumed about 90 times the CPU time of the analytical simulation
method.