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Since no standard modeling description for a semiconductor wafer has
been established so far, one is forced to use each simulation tool's
native wafer description, and to perform a conversion between various
formats. Figure 5.1
lists the wafer descriptions of the VISTA tool set
(PIF) [16], the ISE tool set
(DF-ISE) [40], and the wafer description format used
by TSUPREM (TIF) [94]. Moreover,
Figure 5.1 also lists the conversion tools which are
available to convert a description of a wafer into another
one.
Example 5.3 shows a simulation-flow-model which can be used
to establish a conversion from PIF format to a wafer description using
TIF conventions. The application of such a model would typically be
inside of a network-model where a transition from one wafer
description to another has to be established. It should be stressed
that the simulation-flow-model offers ample flexibility to perform
additional manipulations on the wafer description as it is sometimes
necessary. For example, in some situations it is necessary to re-grid
the wafer before the conversion tool is able to process it, since it
needs a boundary conforming mesh. In this case the gridding step could
easily be integrated into the tool-flow of the
simulation-flow-model of Example 5.3.
Next: 5.2 Performing Device Simulation
Up: 5.1.5 Using Heterogeneous Process
Previous: 5.1.5 Using Heterogeneous Process
Rudi Strasser
1999-05-27