BTRM | Ballistic Transport and Reaction Model |
CBCM | Charge Based Capacitance Measurement |
CD | Critical Dimensions |
CFL | Courant-Friedrichs-Levy |
CMOS | Complementary Metal Oxide Semiconductor |
CMP | Chemical Mechanical Planarization |
CPU | Central Process Unit |
CVD | Chemical Vapor Deposition |
ECAD | Electronic Computer Aided design |
ELSA | Enhanced Level Set Applications |
IADF | Ion Angular Distribution Function |
IC | Integrated Circuit |
ILD | Interlevel Dielectric |
IPD | Input Deck Library |
LDMOS | Laterally Diffused MOS |
LPCVD | Low Pressure Chemical Vapor Deposition |
MOS | Metal Oxide Semiconductor |
MOSFET | Metal Oxide Semiconductor Field Effect Transistor |
PDE | Partial Differential Equation |
PECVD | Plasma Enhanced Chemical Vapor Deposition |
PIF | Profile Interchange Format |
PSLG | Planar Straight Line Graph |
PVD | Physical Vapor Deposition |
RCX | Resistance and Capacitance Extraction |
RESURF | Reduced Surface Field |
RF | Radio Frequency |
RIE | Reactive Ion Etching |
SEM | Scanning Electron Microscope |
SOI | Silicon-On-Insulator |
SIESTA | Simulation Environment for Semiconductor Technology Analysis |
SPICE | Simulation Program with Integrated Circuit Emphasis |
TCAD | Technology Computer Aided Design |
TMOSFET | Trench MOSFET |
TCO | Total Cost of Ownership |
TEOS | Tetraethoxysilane, |
ULSI | Ultra Large Scale Integration |
UV | Ultraviolet |
WSS | Wafer State Server |