For the Analytical Ion Implantation module of PROMIS several standard models for range statistics parameters (Table 2.4-1), one dimensional distribution functions (Table 2.4-2), and depth dependent lateral moments (Table 2.4-3) are available. They meet the basic requirements for silicon and gallium arsenide technologies. The extension of the library of standard models by the user is straightforward. The parameters for the range statistics and the depth dependent lateral moments are stored in ASCII-resource files to support customization and calibration to the local equipment.
