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4. Novel Deposition and Etch Techniques

In this section, some processing techniques which are not included in current state-of-the-art process simulators, but which are gaining more traction in the scientific community, are introduced. Spray pyrolysis deposition is an inexpensive tool for the deposition of crystalline powders [150], which can then be further annealed in order to grow nanowires for sensor and other applications. BiCS flash memory is an emerging technology, proposed by Toshiba as a low-cost memory solution, involving the etching of stacked Silicon and SiO films [206].

• 4.1 Spray Pyrolysis Deposition
  • 4.1.1 Technology Background
  • 4.1.2 Atomization Procedure
  • 4.1.3 Aerosol Transport of Droplets
    • 4.1.3.1 Gravitational force
    • 4.1.3.2 Electrical force
    • 4.1.3.3 Stokes force
    • 4.1.3.4 Thermophoretic force
  • 4.1.4 Precursor Decomposition
    • 4.1.4.1 Process A: low temperature - large initial droplet
    • 4.1.4.2 Process B: lower/intermediate temperature - larger/medium droplet size
    • 4.1.4.3 Process C: intermediate/higher temperature - medium/smaller droplet size
    • 4.1.4.4 Process D: high temperature - small droplet size
• 4.2 Bit Cost Scalable Memory Holes
  • 4.2.1 Technology Background
  • 4.2.2 Etching of Silicon Dioxide
  • 4.2.3 Etching of Silicon

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Next: 4.1 Spray Pyrolysis Deposition Up: Dissertation L. Filipovic Previous: 3.4.3 Nanodot Modeling Using