Dissertation Lado Filipovic

D I S S E R T A T I O N

Topography Simulation of
Novel Processing Techniques

ausgeführt zum Zwecke der Erlangung des akademischen Grades
eines Doktors der technischen Wissenschaften

eingereicht an der Technischen Universität Wien
Fakultät für Elektrotechnik und Informationstechnik
von

Lado Filipovic

Neustiftgasse 67-69/17
A-1070 Wien, Österreich

geboren am 12. Februar 1983 in Sarajevo, Jugoslawien

Wien, im December 2012

Abstract
Kurzfassung
Acknowledgment
Contents
List of Figures
List of Tables
List of Abbreviations
List of Symbols
1. Introduction
- 1.1 Traditional Semiconductor Process Technologies
- 1.2 Approaches to Semiconductor Modeling
  - 1.2.1 Atomistic Approach
  - 1.2.2 Continuum Approach
- 1.3 Motivation for Novel Processing Techniques
- 1.4 Simulator Implementation
  - 1.4.1 Fast Level Set Framework
  - 1.4.2 Surface Rate Calculation
    - 1.4.2.1 Transport Kinetics
    - 1.4.2.2 Surface Kinetics
- 1.5 Outline of the Thesis
2. Silicon Oxidation Techniques
- 2.1 Silicon Dioxide Properties
  - 2.1.1 Molecular Structure of the Silicon-Silicon Dioxide Interface
- 2.2 Thermal Oxidation of Silicon
  - 2.2.1 Kinetics and Growth of Silicon Dioxide
- 2.3 Linear Parabolic Description of Thermal Oxidation Growth
- 2.4 Local Oxidation Nanolithography
3. Simulating Silicon Oxidation
- 3.1 Thermal Oxidation Simulators
- 3.2 Oxidation Modeling using Linear Parabolic Equations
- 3.3 Nitric Acid Oxidation
  - 3.3.1 NAOS Modeling
    - 3.3.1.1 Azeotropic NAOS Method
    - 3.3.1.2 Vapor NAOS Method
- 3.4 Local Oxidation Nanolithography
4. Novel Deposition and Etch Techniques
- 4.1 Spray Pyrolysis Deposition
- 4.2 Bit Cost Scalable Memory Holes
5. Simulating Deposition and Etch Processes
- 5.1 Spray Pyrolysis Deposition Modeling
- 5.2 Modeling BiCS Memory Hole Etching
  - 5.2.1 Carbon Fluorides for Silicon Dioxide Etching
  - 5.2.2 Halogen Gas for Silicon Etching
6. Applications
- 6.1 Silicon Oxidation
- 6.2 Nitric Acid Oxidation
- 6.3 Atomic Force Microscope Lithography
- 6.4 Spray Pyrolysis Deposition
  - 6.4.1 YSZ Deposition using ESD Pyrolysis
  - 6.4.2 Tin Oxide Deposition using PSD Pyrolysis
- 6.5 BiCS Memory Hole Etching
7. Summary and Outlook
A. Droplet Transport Equations for Spray Pyrolysis Modeling
- A.1 Transport under a Velocity-Dependent Acceleration
- A.2 Transport under a Velocity- and Displacement-Dependent Acceleration
B. Generating a Distribution for the Droplet Radius
Bibliography
List of Publications
Curriculum Vitae
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L. Filipovic: Topography Simulation of Novel Processing Techniques