Stressed devices represent a non-symmetrical case. Figure 3.34 shows the calculated curve for the virgin device with a uniform trap distribution of density , shown in Figure 3.32 and for two stressed devices. The damage in the stressed devices is modeled by superposed gaussian distributed traps with peak densities of and as shown in Figures 3.35 and 3.36. The traps reside within the drain junction, whereas the location of the trap peak is chosen relative to the electric-field peak and the electron and hole currents injected into the oxide at the stress bias as explained in Appendix D. Applying the extraction procedure on the difference between the currents in the stressed device and the virgin device , instead of on directly, leads to a significant reduction of the undesired contribution of the term due to the variable in the channel; relationship G.13 in Appendix G. For the traps localized in a narrow interval, the change of with is primarily caused by the change of , while the variation of for the traps which contribute to the charge-pumping current is a second order effect. The distributions recalculated from the curves shown in Figure 3.34 are given in Figures 3.35 and 3.36. Contrary to the claim in the literature [398][9] that the value of the parameter is not critical, this parameter ought to be chosen carefully; it determines the location of the extracted peak. The exact location of the peak of the stress-induced traps relative to the peak of the electric field can be important while discussing the injection and trap-generation mechanisms ([9]). We found that the value of which corresponds to the three hole-capture time constants during the gate pulse base level leads to a shift to the left from the assumed distribution. For Figures 3.35 and 3.36 the corresponding is . This shift is partially due to a finite width of the transition between the active and the inactive charge-pumping areas. The transition region is not a step-like function, but has a finite width of about in the analyzed example. The actual spatial shift in the extracted trap distributions is approximately half of the width of the transition region. The factor in expressions 3.128 and 3.129 corresponds approximately to the middle of the transition regions. The small discrepancy in the amplitude observed in Figures 3.35 and 3.36 stems from longer emission times associated with the localized traps in the junction than with the traps in the channel, which are used to obtain from (see Figure 3.30).
In conclusion, our study has confirmed the ability to accurately extract the spatial trap distributions by using the discussed charge-pumping method II when a proper is assumed and effect is taken into account.