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Next: 8.2.3 Printing of a Up: 8.2 Photoresist Exposure and Previous: 8.2.1 Printing of a

8.2.2 Printing of a Contact Hole over Dielectric Step



  
Figure 8.21: PAC concentration after exposure and developed resist profile for contact hole printing over a dielectric oxide step for coherent illumination (left: best focus, right: 1 $ \mu$m defocus above).
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\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposDielCohe.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
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\includegraphics{REexposDielCoheDef.eps}}
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\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
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\includegraphics{REdevelDielCohe.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REdevelDielCoheDef.eps}}






  
Figure 8.22: PAC concentration after exposure and developed resist profile for contact hole printing over a dielectric oxide step for circular illumination (left: best focus, right: 1 $ \mu$m defocus above).
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\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposDielCirc.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposDielCircDef.eps}}
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\includegraphics{REdevelDielCirc.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REdevelDielCircDef.eps}}






  
Figure 8.23: PAC concentration after exposure and developed resist profile for contact hole printing over a dielectric oxide step for quadrupole illumination (left: best focus, right: 1 $ \mu$m defocus above).
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\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
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\includegraphics{REexposDielQuad.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposDielQuadDef.eps}}
\resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
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\includegraphics{REdevelDielQuad.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REdevelDielQuadDef.eps}}



next up previous contents
Next: 8.2.3 Printing of a Up: 8.2 Photoresist Exposure and Previous: 8.2.1 Printing of a
Heinrich Kirchauer, Institute for Microelectronics, TU Vienna
1998-04-17