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Next: 8.2.4 Two-Dimensional Cross Sections Up: 8.2 Photoresist Exposure and Previous: 8.2.2 Printing of a

8.2.3 Printing of a Contact Hole over Reflective Step



  
Figure 8.24: PAC concentration after exposure and developed resist profile for contact hole printing over a reflective a-silicon step for coherent illumination (left: best focus, right: 1 $ \mu$m defocus above).
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\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposReflCohe.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposReflCoheDef.eps}}
\resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REdevelReflCohe.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REdevelReflCoheDef.eps}}






  
Figure 8.25: PAC concentration after exposure and developed resist profile for contact hole printing over a reflective a-silicon step for circular illumination (left: best focus, right: 1 $ \mu$m defocus above).
\resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposReflCirc.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposReflCircDef.eps}}
\resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
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\includegraphics{REdevelReflCirc.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REdevelReflCircDef.eps}}






  
Figure 8.26: PAC concentration after exposure and developed resist profile for contact hole printing over a reflective a-silicon step for quadrupole illumination (left: best focus, right: 1 $ \mu$m defocus above).
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\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposReflQuad.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REexposReflQuadDef.eps}}
\resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...{0.5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REdevelReflQuad.eps}} \resizebox{0.45\textwidth}{!}{
\psfrag{xlab}{1.0 $\mu$ m}
\psfrag{ylab}{\rotateb...
...5 $\mu$ m}}
\psfrag{zlab}{0.7 $\mu$ m}
\includegraphics{REdevelReflQuadDef.eps}}



next up previous contents
Next: 8.2.4 Two-Dimensional Cross Sections Up: 8.2 Photoresist Exposure and Previous: 8.2.2 Printing of a
Heinrich Kirchauer, Institute for Microelectronics, TU Vienna
1998-04-17