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PhD Thesis Heinrich Kirchauer
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Acknowledgment
Contents
Contents
List of Figures
List of Tables
1. Introduction
1.1 Semiconductor Technology
1.1.1 Unit Processes
1.1.2 Process Integration
1.2 The Role of Technology CAD
1.3 Outline of the Thesis
2. The Photolithography Process
2.1 Some Fundamental Considerations
2.2 Operation Principle
2.3 Illuminator
2.3.1 Light Source
2.3.2 Condenser Lens
2.3.3 Partial Coherence and Advanced Apertures
2.4 Photomask
2.4.1 Binary Masks
2.4.2 Phase-Shifting Masks
2.5 Optical System
2.5.1 Contact and Proximity Printing
2.5.2 Projection Printing
2.6 Photoresist
2.6.1 Contrast and Important Properties
2.6.2 Composition of DQN Resist
2.6.3 Processing Issues
2.6.4 Advanced Resist Systems
2.7 Nanolithography
2.7.1 Extreme Ultraviolet
2.7.2 X-Ray
2.7.3 Electron-Beam
2.7.4 Ion-Beam
3. Photolithography Simulation
3.1 Modeling Phases and Basic Simulator Structure
3.2 Practical Characterization
3.2.1 Focus Effects and Process Window
3.2.2 Point Optimization of the Aerial Image
3.2.3 Lumped Parameter Model
3.3 Modeling of Technology Innovations
3.3.1 Die-Size Simulation of Optical Proximity Correction
3.3.2 Feature-Size Simulation and Advanced Physical Modeling
3.4 Existing Simulators and Future Perspectives
4. Aerial Image Simulation
4.1 Principles of Fourier Optics
4.1.1 Scalar Diffraction Theory
4.1.2 Phase Transformation Properties of a Lens
4.1.3 Fourier Analysis of an Imaging System
4.1.4 Köhler Illumination of a Periodic Mask
4.1.5 Vector-Valued Extension
4.2 Lens Aberrations and In-Lens Filter
4.2.1 Defocus
4.2.2 Power Series Representation of Primary Seidel Aberrations
4.2.3 Zernike Polynomials for General Aberration Terms
4.2.4 In-Lens Filters
4.3 Advanced Illumination Aperture
4.3.1 Abbe's Method
4.3.2 Hopkins' Method
4.4 Numerical Implementation
4.4.1 ``Alias Free'' Forward Transform
4.4.2 Numerical Backward Transform
5. Photoresist Exposure/Bleaching Simulation
5.1 Exposure Kinetics
5.1.1 Absorption in a Dilute Solution
5.1.2 Modeling of Conventional Resists
5.1.3 Modeling of Chemically Amplified Resists
5.1.4 Simulation Flow
5.2 Field Calculation over Planar Topography
5.2.1 Vertical Propagation Method
5.2.2 Scaled Defocus Method
5.2.3 Transfer Matrix Method
5.2.4 Beam Propagation Method
5.3 Field Calculation over Nonplanar Topography
5.3.1 Rigorous Electromagnetic Solution
5.3.2 Approximate Electromagnetic Solution
6. Differential Method
6.1 Fundamentals
6.1.1 Problem Formulation
6.1.2 Operation Principle
6.2 Lateral Discretization of the Maxwell Equations
6.2.1 First Maxwell Equation
6.2.2 Second Maxwell Equation
6.2.3 Elimination of the Vertical Field Components
6.2.4 Scaling of the Ordinary Differential Equation System
6.2.5 Truncation of the Fourier expansions
6.2.6 Vector-Matrix Notation
6.3 Formulation of the Boundary Conditions
6.3.1 Air/Resist Interface
6.3.2 Resist/Substrate Interface
6.3.3 Vector-Matrix Notation
6.4 Vertical Discretization of the Maxwell Equations
6.4.1 Two-Point Boundary Value Problem
6.4.2 Numerical Solution Techniques for Boundary Value Problems
6.4.3 Shooting Method
6.5 Discussion
6.5.1 Performance
6.5.2 Limitations
6.5.3 Comparison with the Waveguide Method
7. Photoresist Bake and Development Simulation
7.1 Bake Steps
7.1.1 Prebake
7.1.2 Post-Exposure Bake
7.2 Development
7.2.1 Development Rate Modeling
7.2.2 Surface Advancement
8. Simulation Examples
8.1 Aerial Image Simulation of the Layout of a Multiplexer
8.1.1 Entire Layout
8.1.2 Imaging Enhancement Techniques
8.2 Photoresist Exposure and Development Simulation
8.2.1 Printing of a Contact Hole over Planar Substrate
8.2.2 Printing of a Contact Hole over Dielectric Step
8.2.3 Printing of a Contact Hole over Reflective Step
8.2.4 Two-Dimensional Cross Sections of the Printed Contact Holes
9. Conclusion and Outlook
A. Approximation of the Inclination Factor
B. Analytical Fourier Transformations
B.1 Triangular Patterns
B.2 Rectangular Patterns
B.3 Numerical Evaluation
C. Stratified Medium
C.1 One Homogeneous Planar Layer
C.2 Stack of Homogeneous Planar Layers
D. Nonplanar Material Interface
Bibliography
List of Publications
Curriculum Vitae
Heinrich Kirchauer, Institute for Microelectronics, TU Vienna
1998-04-17