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3.4 Existing Simulators and Future Perspectives

The availability of simulation tools with extended physical models, rapid algorithms, design options, and convenient user interfaces is improving rapidly. There are mainly two types of sites developing and providing simulators:

Table 3.1 summarizes some well-known simulators in alphabetical order. Most of the functionality assisting the practical characterization as described in Section 3.2 is implemented in the commercial tools and with a smaller extent also in university codes. Advanced models needed for the simulation of technology innovations (cf. Section 3.3), however, are barely available from commercial vendors. Here lies the strength of universities in developing extended physical simulators since they rather have the possibility to perform basic research and can also directly cooperate with semiconductor manufacturers. In this thesis the emerging problem of a rigorous electromagnetic treatment of topography effects is investigated and a new three-dimensional simulation model is developed.


 
Table 3.1: Summary of lithography simulators (after [101, p. 667]).
 

Program Organization Developers
DEPICT Technology Modeling Associates, Palo Alto, CA http://www.tmai.com/PRODUCT/depict.html D.A. Bernard [102,103]
FAIME Vector Technologies, Bethesda, MD E. Barouch [104,65]
METROPOLE Carnegie Mellon University, Pittsburgh, PA A.J. Strojwas% latex2html id marker 30857
\setcounter{mpfootnote}{2}\fnsymbol{mpfootnote} [105,10]
OPTOLITH% latex2html id marker 30860
\setcounter{mpfootnote}{3}\fnsymbol{mpfootnote} Silvaco International, Sunnyvale, CA http://www.silvaco.com/products/athena/optolith/optolith.html W. Henke [106]
PROLITH FINLE Technology, Austin, TX http://www.finle.com/Prolith/software.html C.A. Mack [107,108]
SAMPLE University of California, Berkeley, CA http://tanqueray.eecs.berkeley.edu/tcad/tcad.html A.R. Neureuther% latex2html id marker 30869
\setcounter{mpfootnote}{3}\fnsymbol{mpfootnote} [109,110]
SOLID-C% latex2html id marker 30871
\setcounter{mpfootnote}{3}\fnsymbol{mpfootnote} Sigma-C, Munich, Germany http://www.sigma-c.de/solid-c/default.html W. Henke [106]


% latex2html id marker 30857
\setcounter{mpfootnote}{2}\fnsymbol{mpfootnote} The simulators METROPOLE and SAMPLE are both university codes. In the developer column just the responsible Professor is noted, although most of the work was done by Ph.D. students.
% latex2html id marker 30860
\setcounter{mpfootnote}{3}\fnsymbol{mpfootnote} The simulators OPTOLITH and SOLID-C are both based on the code SOLID that was originally developed at the Fraunhofer Institut für Siliziumtechnologie, Itzehoe, Germany (http://www.isit.fhg.de/english/simulation/solid.html).




next up previous contents
Next: 4. Aerial Image Simulation Up: 3. Photolithography Simulation Previous: 3.3.2 Feature-Size Simulation and
Heinrich Kirchauer, Institute for Microelectronics, TU Vienna
1998-04-17