Next: 3.3.2 Semiconductor-Insulator Interfaces
Up: 3.3.1 Semiconductor-Semiconductor Interfaces
Previous: 3.3.1.1 Continuous Quasi-Fermi Level
For the modeling of heterointerfaces, i.e., with non-negligible
band gap discontinuity, a thermionic field emission model is used
which can be applied either without or with tunneling over the
interface. It constitutes a Neumann interface condition. The
relations for the current density and energy fluxes
across the interface read:
|
|
|
(3.87) |
|
|
|
(3.88) |
|
|
|
(3.89) |
|
|
|
(3.90) |
with = n,p represents the effective
masses at both sides of the interface between the segments i=1
and i=2, respectively.
represents the conduction
or valence band discontinuity. The effective barrier reduction
is modeled as function of the electric field
orthogonal to the interface.
|
|
|
(3.91) |
A fit of the barrier reduction
for the
AlGaAs/InGaAs interface was
performed in [50] and extended to different material
systems, such as AlGaAs/GaAs, InAlAs/ InGaAs, and AlGaN/GaN. The
tunneling parameters are found in Table 3.33. These are
effective fitting parameters, however, they scale with the
tunneling probabilities found in Appendix B.
Table 3.33:
Tunneling parameters for various materials.
Material |
Material Composition |
|
|
|
[nm] |
AlGaAs/GaAs |
- |
3 |
AlAlAs/InGaAs |
- |
7 |
InAlAs/InGaAs |
- |
8 |
InAlAs/InGaAs |
0.33 x 0.66 |
7-8 |
AlGaN/GaN |
0.25 |
3 |
|
The thermionic field emission velocity for the segment i
is defined as follows:
|
|
|
(3.92) |
The thermal boundary condition between semiconductors
in general reads as follows:
|
|
|
(3.93) |
In the case of heterointerfaces additional entries are necessary in the DD simulation to
account for the carriers loosing or gaining energy.
|
|
div |
(3.94) |
For the HD case this is not required, since the energy relations
yield this condition self-consistently.
Next: 3.3.2 Semiconductor-Insulator Interfaces
Up: 3.3.1 Semiconductor-Semiconductor Interfaces
Previous: 3.3.1.1 Continuous Quasi-Fermi Level
Quay
2001-12-21