Next:
List of Abbreviations
Up:
Dissertation M. Rovitto
Previous:
List of Figures
List of Tables
1.1.
Activation energies for various diffusional paths in copper interconnects [
105
].
5.1.
Materials parameters for the electro-thermal and solid mechanics models [
40
,
38
].
5.2.
Materials parameters for the vacancy dynamics and diffuse interface models [
40
].
5.3.
Materials parameters for the electro-thermal, vacancy dynamics, and solid mechanics models [
40
,
38
,
31
]..
5.4.
Materials parameters for the vacancy dynamics model [
40
,
25
].
Next:
List of Abbreviations
Up:
Dissertation M. Rovitto
Previous:
List of Figures
M. Rovitto: Electromigration Reliability Issue in Interconnects for Three-Dimensional Integration Technologies