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A.1.3 The Concrete MOSFET (II): Sub-Micron Transistors

Reducing the gate length to the point where the depletion depth \ensuremath{X_{\mathit{d}}} and the depletion widths of the source-bulk and drain-bulk junctions become a significant fraction of \ensuremath {L} leads to short-channel devices. Although this is a purely electrical phenomenon which is independent of geometrical scale, this transition became important as the minimum feature size, i.e., \ensuremath {L} entered the sub-micron regime. As a first consequence, the framework of simple drain-current equations loses its validity. An empirical equation for \ensuremath{I_{\mathit{D}}} is

\begin{displaymath}
\ensuremath{I_{\mathit{D}}}\xspace = \ensuremath{\beta }\xs...
...}}\xspace }{\ensuremath{U_{\mathit{T}}}\xspace }\right)^\zeta
.\end{displaymath} (A.17)

For an up-to-date discussion of sub-micron devices beyond the following simple introduction see [79,A8,A9,A0].

Figure A.3: Advanced deep-sub-micron MOSFET
\includegraphics[scale=1.0]{real-fet.eps}






G. Schrom