Eigene Veröffentlichungen

[1]

E. STRASSER, K. WIMMER, AND S. SELBERHERR. A New Method for Simulation of Etching and Deposition Processes. In Proceedings: 1993 International Workshop on VLSI Process and Device Modeling, Nara, Mai 1993, pp. 54-55.

[2]

E. STRASSER AND S. SELBERHERR. A General Simulation Method for Etching and Deposition Processes. In Proceedings: Simulation of Semiconductor Devices and Processes, Wien, Sept. 1993, pp. 357-360.

[3]

E. STRASSER AND S. SELBERHERR. Analysis of the Fabrication Process of Multilayer Vertical Stacked Capacitors. In Proceedings: European Solid State Device Research Conference, Grenoble, Sept. 1993, pp. 587-590.

[4]

E. STRASSER, G. SCHROM, K. WIMMER, AND S. SELBERHERR. Accurate Simulation of Pattern Transfer Processes Using Minkowski Operations. IEICE Transactions on Electronics, Vol. E77-C, No. 2, Feb. 1994, pp. 92-97.

[5]

E. STRASSER AND S. SELBERHERR. Three-Dimensional Simulation of Step Coverage for Contact Hole Metallization. In Proceedings: European Solid State Device Research Conference, Edinburgh, Sept. 1994, pp. 339-342.

[6]

E. STRASSER AND S. SELBERHERR. A New Method for Topography Simulation. Submitted to: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

[7]

E. STRASSER AND S. SELBERHERR. Three-Dimensional Models and Algorithms for Wafer Topography Evaluation (invited). To appear in proceedings: Microelectronics-94 Conference, Moskau, Dec. 1994.