4.4 Methodology Overview
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The 2D extraction procedure is described using an N-channel MOSFET. The same
procedure can be applied to a P-channel device.
- Input parameters determination: Several important parameters values
are obtained by independent experimental means. The oxide thickness ()
is first determined using one capacitance measurement in the accumulation
region as suggested in [87]. The polysilicon gate length ()
and polysilicon gate concentration () are then extracted by matching
experimental gate-to-channel quasi-static capacitances () and
simulated results that take into account the polysilicon depletion effect
[42][33]. Finally, the source/drain diode
donor profile is measured directly using a 1D direct technique such as
secondary ion mass spectrometry (SIMS).
- Starting guess 2D profile: An initial TPS representation
is generated by combining 1D channel and source/drain profiles assuming
a subdifusion factor for the donors rotation that will result in the
measured effective channel length. The 1D profiles are determined
by inverse modeling from deep depletion MOS and source/drain diode
reverse junction capacitance respectively. It is noted that a good
initial guess is important to avoid the trapping of the solution in a local
minimum and to limit the number of iteration before converging to the solution.
- 2D extraction: Finally, an optimization to extract the TPS
coefficients of the doping for both acceptors and donors is performed.
The nonlinear least-squares solver is used to minimize the fit
criterion between experimental and simulated gate and source/drain
diode capacitance values.
In the following sections, the results of each extraction step in the
procedure are presented. These include the 1D MOS and source/drain diode
profiling results used in the generation of the initial 2D guess and
the 2D extraction results.
The method was applied to data collected from devices fabricated using
a retrograde n-well, salicided dual-gate CMOS process [44][43].
All experimental C-V characteristics were obtained using an HP4145B parameter
analyzer and an HP 4275A LCR meter. The measurement frequency of the HP 4275A
LCR meter was set to 100 kHz. The resolution of the system is around 0.1 fF.
In order to reduce the noise level in the measured results, the experimental
data for sub 0.5m devices were averaged for several measurements.
As a result, the actual resolution of experimental data is better
than 0.1 fF.
Next: 4.5 One-Dimensional MOS Doping
Up: 4 MOSFET Profiling Using
Previous: 4.3 Profile Representation
Martin Stiftinger
Tue Aug 1 19:07:20 MET DST 1995