2.1 TCAD Tasks

 

TCAD tasks range from unit-process analysis and device characterization to yield optimization and technology selection. With tools and application strategies gradually maturing, emphasis is being shifted from point-tool applications to fully integrated and automated VLSI design modeling. Two dimensional simulation is the regular case, although shrinking device dimensions and topologically more complex designs render three-dimensional simulation more and more important. Mixed one-dimensional and two-dimensional simulation is still being used in cases where trends have to be analyzed quickly or extremely expensive models are being used.

 
• 2.1.1 Unit Process Analysis
• 2.1.2 Device Analysis and Characterization
• 2.1.3 Interconnect Simulation
• 2.1.4 Circuit Simulation
• 2.1.5 Process Tuning
• 2.1.6 Calibration
  • Tool Calibration
  • Global Calibration
  • Experimental Data
• 2.1.7 Sensitivity Analysis
• 2.1.8 Design Centering and Yield Optimization
• 2.1.9 Device Matching
• 2.1.10 Technology Development and Evaluation
• 2.1.11 Process Synthesis
• 2.1.12 Inverse Modeling