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2. Gate Stack Overview

There are numerous gate stack types currently in use. Their classification can either be done by their application (e.g. digital switch, RAM, amplifier, BioFET, DNAFET) or by their material properties (ferroelectric, magnetic, electrolytic).

In the following there will be four selected gate stack types treated, namely, high-k, strained interface, ferroelectric, and electrolytic gate stacks. At first an introduction into high-k gate stacks for amplification and switching purposes will be given. Then, gate stack architectures for storage devices are described. Due to their rising importance over the last years flash-type FETs will be explained in more detail, followed by an examination of techniqes able to introduce strain into the device arcitecture in order to boost the device performance. Afterwards, an introduction into ferroelectric materials and their properties is shown and last electrolytic interfaces and their exploitation in BioFETs will be taken care of.


Subsections
next up previous contents
Next: 2.1 High-k Gate Stacks Up: Dissertation T. Windbacher Previous: 1. Introduction

T. Windbacher: Engineering Gate Stacks for Field-Effect Transistors