Contents

• List of Figures
• List of Tables
• 1. Introduction
• 2. The Processing Chain in Semiconductor Manufacturing
  • 2.1 Overview
  • 2.2 Design
  • 2.3 Layout
  • 2.4 Mask Generation
    • 2.4.1 Introduction
    • 2.4.2 Imaging Basics
    • 2.4.3 Optical Proximity Effect
  • 2.5 Fabrication
    • 2.5.1 Description of Semiconductor Manufacturing Processes
    • 2.5.2 Lithography
    • 2.5.3 Ion Implantation
    • 2.5.4 Diffusion
    • 2.5.5 Film Deposition
    • 2.5.6 Etching
  • 2.6 Electrical Test
  • 2.7 Sort and Final Test
  • 2.8 Packaging
  
  
• 3. The TCAD Concept
  • 3.1 Introduction and State-Of-The-Art
    • 3.1.1 Process Simulation
    • 3.1.2 Device Simulators
    • 3.1.3 TCAD Work Flow Environment Software (``Workbenches'')
  • 3.2 Overview
  • 3.3 TCAD Input
    • 3.3.1 Layout
    • 3.3.2 Mask Bias
    • 3.3.3 Process Conditions
  • 3.4 Process Simulation
  • 3.5 Re-Meshing and Boundary Processing
  • 3.6 Contact Definition
  • 3.7 Device Simulation
  • 3.8 Electrical Key-Parameter Extraction
  • 3.9 Optimization and Inverse Modeling
  
  
• 4. Integration between Semiconductor Fabrication and TCAD
  • 4.1 Introduction
  • 4.2 Interfaces
    • 4.2.1 Between Design/Layout as Process Simulation Input
    • 4.2.2 Between Process Flow Description and Process Simulation Command File
    • 4.2.3 Between Electrical Test and Device Simulation
    • 4.2.4 Between Device Characterization and Device Modeling (SPICE)
  • 4.3 Package Modeling Interface
  
  
• 5. Implementation
  • 5.1 Layout Interface
  • 5.2 Process Flow Interface
    • 5.2.1 Semiconductor Process Flows in Development
    • 5.2.2 Semiconductor Process Flows in Production
    • 5.2.3 Diffusion Recipes
    • 5.2.4 Other Recipes
    • 5.2.5 Conclusions
  • 5.3 Electrical Test Interface
    • 5.3.1 Introduction
    • 5.3.2 Electrical Parameter Test
    • 5.3.3 Documentation
    • 5.3.4 Conclusions
  • 5.4 SPICE Modeling Interface
  
  
• 6. Industrial Application of TCAD
  • 6.1 Transfer of Semiconductor Diffusion and Oxidation Process Recipes Between 4" and 8" Wafer Fabrication Facilities
  • 6.2 Documentation and Training
  • 6.3 Layout and Mask Generation
    • 6.3.1 Proximity Correction of Masks
    • 6.3.2 Integrating an EEPROM Module into a State-of-the-Art Silicon Foundry Process with Three-Dimensional TCAD
    • 6.3.3 Generation of 3D-Mask Photo Resist Shape for lateral PIN-Diodes
  • 6.4 Inverse Modeling of Polycrystalline Fuses
    • 6.4.1 Introduction
    • 6.4.2 Experiment
    • 6.4.3 Simulation and Inverse Modeling
    • 6.4.4 Results and Discussion
    • 6.4.5 Conclusions
  • 6.5 Using TCAD with SPC
    • 6.5.1 Introduction
    • 6.5.2 Computational Effort
    • 6.5.3 Selecting a Set of Parameters
    • 6.5.4 Simulation Results
    • 6.5.5 Conclusions
  
  
• 7. Summary and Outlook
• A. Basis of the GAUSSIAN Normal Distribution Function
  • A.1 The GAUSSIAN Normal Distribution
  • A.2 The Central Limit Theorem
    • A.2.1 Theorem
    • A.2.2 Proof
  
  
• B. Layout Data Formats
  • B.1 Caltech Intermediate Format (CIF)
    • B.1.1 Geometry
    • B.1.2 Hierarchy
    • B.1.3 Control
  • B.2 Calma GDS II stream format (GDSII)
    • B.2.1 Record Format
    • B.2.2 Library Head and Tail
    • B.2.3 Structure Head and Tail
    • B.2.4 Boundary Element
    • B.2.5 Path Element
    • B.2.6 Structure Reference Element
    • B.2.7 Array of Structures Element
    • B.2.8 Text Element
    • B.2.9 Node Element
    • B.2.10 Box Element
  • B.3 Electronic Design Interchange Format (EDIF)
    • B.3.1 EDIF Structure
    • B.3.2 Contents
    • B.3.3 Interface
    • B.3.4 View Maps
    • B.3.5 Technology
  • B.4 Electron Beam Exposure System (EBES) Format
    • B.4.1 File Structure
    • B.4.2 Control Commands
    • B.4.3 Rectangles
    • B.4.4 Parallelograms
    • B.4.5 Trapezoids
  
  
• C. General Algorithm for Polygon-Biasing
• D. From Boltzmann Distribution to Drift-Diffusion Current Equations
• E. Diffraction in Far Field Approximation
  • E.1 Linear Approximation
  • E.2 Circular Aperture
  • E.3 Rectangular Aperture
  
  
• Bibliography
• Own Publications